presented by the Rocky Mountain AVS

To register for short courses for  the Rocky Mountain Chapter Symposium go to the National AVS

Rocky Mountain AVS Short Course Registration

Short course selection will be available soon.    For your reference, the following courses were proposed and offered last year.

For more information about registration for the courses at National AVS contact Heather Korff,  heather@avs.org  (530)-896-0477 .

Have a request?

For more information or to suggest/request a short course, please contact:

Neil Peacock

neiltpeacock@gmail.com -or-

Tim Gessert


Fundamentals of Vacuum Technology

Neil Peacock Development Engineer for MKS Instruments, Inc. Tim Gessert Senior Scientist, National Renewable Energy Laboratory Monday June 1 to Thursday June 4, 2015

Course Objectives

  • Understand vacuum fundamentals essential to operating, maintaining, designing, or using vacuum systems.
  • Know the working principles and limitations of pumps, gauges, and other vacuum system components.
  • Understand the procedures for operating and performing preventive maintenance on vacuum systems, including analyzing and troubleshooting malfunctioning vacuum systems and leak detection.
  • Learn the design concepts involved in matching equipment and instrumentation to applications.

Part I     Concept/calculations/gauging/pumps Part II   Materials, valves and other components, system design considerations and maintenance

Plasma Science & Diagnostics for Materials Processing

Colin Wolden, Professor of Chemical Engineering, Colorado School of Mines Wednesday June 3, 2015


  • Learn the basic physics involved in non-equilibrium glow discharges used for materials processing
  • Understand the common reactions th at occur in reactive plasmas
  • The practical implications of these concepts will be demonstrated through their application in common plasma diagnostics such as Langmuir probe and optical emission spectroscopy


This course will provide an overview of the basic physics involved in non-equilibrium glow discharges used for materials processing. We will briefly discuss commonly used plasma configurations and their applications. The basic structure of a DC plasma will be described, as well as the important differences in RF and Magnetron sources. The characteristics of a homogeneous bulk plasma will be described, along with the changes that occur when a plasma interacts with a surface (sheath formation, Bohm Criterion, Child sheath law). These concepts will be illustrated through their practical application in the use of Langmuir probes, one of the most commonly used plasma diagnostics. Finally, we will discuss the common reactions that occur in a plasmas (Dissociation, Excitement, Ionization, etc), and describe how there rates may be evaluated using cross sections and the electron energy distribution function (EEDF). The importance of these concepts will be demonstrated through their practical implications for understanding optical emission spectroscopy (OES) and actinometry.

Transparent Conducting Oxides: Applications, Science, Fabrication, and Characterization

Tim Gessert Senior Scientist, National Renewable Energy Laboratory Wednesday June 3, 2015

Course Objectives

  • Learn the historical development and present applications of typical TCO films.
  • Understand fundamental properties and science of TCOs.
  • Learn deposition and processing of TCO films.
  • Learn characterization of TCO films
  • Review new directions in TCO development

Sputter Deposition

Joe Greene, Professor of Materials Science and Head of Electronics Materials Division, University of Illinois Wednesday June 3 and Thursday June 4 June 2015 

 Course Objectives

  • Processes controlling film growth and properties
  • The role of energetic particles in controllably modifying these processes
  • Target sputtering effects
  • Nature and energy of sputtered atoms
  • Learn about magnetron (both balanced and magnetically unbalanced), diode, triode, and ion beam systems
  • Learn about DC, pulsed DC, mid-frequency AC, and RF systems for targets and substrates
  • Understand reactive sputtering of conducting and dielectric layers
  • Understand film properties and learn system parameters

Evaporation for Thin Film Deposition (CANCELLED)

Joe Greene, Professor of Materials Science and Head of Electronics Materials Division, University of Illinois Tuesday June 2, 2015

Course Objectives (CANCELLED)

  • Learn about a broad range of evaporation techniques: mechanisms, technology and fundamentals.
  • Evaporation and equilibrium vapor pressure (thermodynamics and kinetics)
  • Thermal and electron beam evaporation sources
  • Evaporation of alloys and compounds: kinetics and materials considerations.
  • MBE (solid source and gas source): system design and film growth kinetics.
  • The role of energetic particles: ion plating, ion-beam assisted deposition, etc.
  • Pulsed-laser and Vacuum-arc deposition
  • Processes controlling film growth and properties

Introduction to Surface Analysis (CANCELLED)

Tom Christensen  Professor of Physics, University of Colorado at Colorado Springs. Thursday June 4, 2015

Course Objectives (CANCELLED)

  • Learn about common surface analysis techniques for measuring a wide range of properties of solid surfaces.
  • Understand the capabilities and limitations of common surface analysis techniques.

Course description

This course provides a broad introduction to common surface analysis techniques. After a brief overview of the unique features of surfaces, we introduce surface analysis techniques used for imaging, structural and chemical determinations, optical characterization, thermal and thermodynamic measurements, electrical and magnetic characterization, and mechanical property determination. Capabilities and limitations of the techniques will be presented.


Who should attend?

  • Those seeking a broad survey of surface analysis techniques to identify potential methods for characterizing surface properties of a wide range of samples for in-house or outsourced analysis.
  • Those who conduct surface analysis characterizations or specify measurements to be performed.

Partial Pressure Analysis with Residual Gas Analyzers (CANCELLED)

Gerardo Brucker Chief Scientist and CTO  Granville-Phillips Division of MKS Instruments Wednesday June 3, 2015

Course Objectives (CANCELLED)

  • Provide the basic knowledge required to operate residual gas analyzers (RGAs) for vacuum applications ranging from UHV to atmospheric pressures.
  • Learn how to specify the best RGA system for your application.
  • Learn to configure RGA software to track real-time changes in gas composition.
  • Know how to differentiate between background and process gases and how to identify common interactions between RGAs and sample gases.
  • Learn how to quickly and effectively interpret typical RGA spectra to monitor the quality of your vacuum.

Courses by Request

AVS is pleased to announce “Courses By Request.” Through an online form, you tell us which course(s) you need, the time frame in which you need them offered, how many people (other than yourself) are interested in the same course(s), and your traveling restrictions. As requests are received, the Committee will work to identify additional interested participants, and schedule the course(s) at a facility and date that will meet everyone’s needs. To request an AVS Short Course just complete the “Courses By Request” online form,  http://www.avs.org/Education-Outreach/Short-Courses/Short-Courses-by-Request    If you have any questions about AVS Short Courses send us a note at courses@avs.org or  call us between 8:30 a.m. and 4:30 p.m. Pacific time at 530-896-0477.